Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing 0Ymposium Held November 29-December 2, 1999, Boston, Massachusetts, U.S.A.

Many technologically important thin-film growth, processing and surface modification techniques employ low-energy (hyperthermal and keV) particles. Energetic particle sources include ion beams (for growth and sputter etching), cluster beams, pulsed-laser beams and plasmas. Phenomenological evidence suggests that the use of these energetic particles can change growth modes and provide control of surface morphology and film properties. The key to improving this control is to better understand how the energetic beams influence film and surface properties and the microscopic mechanisms responsible for beam-induced effects. This volume addresses many of these issues including growth, ion erosion, surface smoothing, texturing and pattern formation, etching, structural stabilization and stress relaxation. Materials modification from the nanoscale to the mesoscale and macroscale are discussed. Technological applications are also featured and include thin-film transistors, microelectronics, materials for X-ray mirrors, high-temperature superconductors, sensors and diamond-like coatings. Papers on modeling and analysis of these processes using techniques including molecular dynamic simulations are also included.Moss, S. is the author of 'Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing 0Ymposium Held November 29-December 2, 1999, Boston, Massachusetts, U.S.A.' with ISBN 9781558994935 and ISBN 1558994939.