Handbook of Photomask Manufacturing Technology

As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it is increasingly important for new technologies to keep pace with these demands. Photomask technology is one of the key areas to achieving this goal. This valuable reference provides a comprehensive summary of all areas of mask technology in a single work, featuring contributions from 40 internationally reputable authors from industry, academia, government, national labs, and consortia. They discuss conventional masks and their supporting technologies, as well as next-generation technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography.Rizvi, Syed A. is the author of 'Handbook of Photomask Manufacturing Technology', published 2005 under ISBN 9780824753740 and ISBN 0824753747.