Comments: Former Library book. Shows some signs of wear, and may have some markings on the inside. 100% Money Back Guarantee. Shipped to over one million happy customers. Your purchase benefits world literacy!
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Publisher: Materials Research Society
Kaufman, David Y., Hoffmann-Eifert, Susanne, Gilbert, Stephen R.
This volume, the most recent is a longstanding and popular series from the Materials Research Society, presents the latest technological and scientific advances in ferroelectric thin films from academia, government laboratories and industry worldwide. Papers focus on impressive developments and an expanding scientific understanding of FeRAMs, pyroelectric imaging arrays, piezoelectrics, high-permittivity capacitors and high-frequency devices. Significant progress on the integration of ferroelectric thin films on silicon is reviewed and continuing developments in deposition techniques, processing-property relationships, and the fundamental understanding of ferroelectricity in thin films are featured.Kaufman, David Y. is the author of 'Ferroelectric Thin Films XI' with ISBN 9781558996854 and ISBN 1558996850.
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