Fundamentals of Semiconductor Fabrication
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ALTERNATE EDITION: This is the brand new
international edition with
same contents as the US
version. ... [more] ALTERNATE EDITION: This is the brand new
international edition with
same contents as the US
version. Why spend more?
Some of the international
editions may be Indian
editions printed in black
and white with identical
contents as the US edition. [less]
international edition with
same contents as the US
version. ... [more] ALTERNATE EDITION: This is the brand new
international edition with
same contents as the US
version. Why spend more?
Some of the international
editions may be Indian
editions printed in black
and white with identical
contents as the US edition. [less]
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Publisher: John Wiley & Sons Inc Summary: This concise introduction to semiconductor fabrication technology covers everything professionals need to know, from crystal growth to integrated devices and circuits. Throughout, the authors address both theory and the practical aspects of each major fabrication step, including crystal growth, silicon oxidation, photolithography, etching, diffusion, ion implantation, and thin film deposition. The book integrates Com [read more]
9780471232797
ISBN:0471232793
Pub Date: 2003Publisher: John Wiley & Sons Inc Summary: This concise introduction to semiconductor fabrication technology covers everything professionals need to know, from crystal growth to integrated devices and circuits. Throughout, the authors address both theory and the practical aspects of each major fabrication step, including crystal growth, silicon oxidation, photolithography, etching, diffusion, ion implantation, and thin film deposition. The book integrates Com [read more]
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ISBN-13:
ISBN:
Pub Date: 2003
Publisher: John Wiley & Sons Inc
9780471232797
ISBN:
0471232793
Pub Date: 2003
Publisher: John Wiley & Sons Inc
This concise introduction to semiconductor fabrication technology covers everything professionals need to know, from crystal growth to integrated devices and circuits. Throughout, the authors address both theory and the practical aspects of each major fabrication step, including crystal growth, silicon oxidation, photolithography, etching, diffusion, ion implantation, and thin film deposition. The book integrates Computer Modeling & Simulation tools throughout. Process simulation is used as a tool for what-if analysis and discussion. Comprehensive coverage of process sequences helps readers connect individual steps into a cohesive whole.
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